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New Intel 65 nm lithography promises reduced leakage for small devices

Tags:
  • Intel
  • Devices
  • Power
Anonymous
April 15, 2008 7:28:24 PM

In a further demonstration of Intel's renewed focus on power conservation over performance where necessary, the company is announcing the addition of a new, alternative lithography process for the 65 nm category that stresses orders-of-magnitude reductions in power leakage.

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