Image of the transistor. From top to bottom: Low resistance layer, metal gate (consisting of two different materials), high-k oxide layer, silicon channel. - Picture Story

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Intel releases 45nm processor details

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Intel releases 45nm processor details

8:10 PM - January 25, 2007 by The Editors of Tom's Hardware
Source: Tom's Hardware – Keywords: intel-releases-45nm-processor-details
Categories: AMD/ATI, INTEL
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Image of the transistor. From top to bottom : Low resistance layer, metal gate (consisting of two different materials), high-k oxide layer, silicon channel.

Current flow within the transistor and silicon channel (source to drain). Intel claims that the transistor design increases drive current by 20%, resulting in a 20% performance increase over the preceding design used in 65 nm processors. At the same clock
Intel says that the high-k transistor technology was used already in its 45 nm SRAM chip announced in early 2006.

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