Sign in with
Sign up | Sign in

Ion Doping

Intel Shows How A CPU Is Made
By , Kevin Parrish, Intel Corporation
Ion Doping

Through a process called ion implantation (one form of a process called doping) the exposed areas of the silicon wafer are bombarded with ions. Ions are implanted in the silicon wafer to alter the way silicon in these areas conduct electricity. Ions are propelled onto the surface of the wafer at very high velocities. An electrical field accelerates the ions to a speed of over 300,000 km/hour (roughly 185,000 mph)

See more See less
React To This Article