Results for lithography

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  • Nikon ships first immersion lithography system for 55 nm chip production
    February 16, 2006 – 1:55 PM
    Nikon Precision today said that it has shipped the world's first production immersion lithography system.
  • TSMC: Immersion lithography nearly production ready
    February 24, 2006 – 11:42 AM
    Taiwan Semiconductor Manufacturing Company (TSMC) revealed that its immersion lithography program has produced test wafers well within acceptable parameters for volume manufacturing, according to a company press release.
  • New Intel 65 nm lithography promises reduced leakage for small devices
    September 20, 2005 – 4:30 PM
    In a further demonstration of Intel's renewed focus on power conservation over performance where necessary, the company is announcing the addition of a new, alternative lithography process for the 65 nm category that stresses orders-of-magnitude reductions in power leakage.
  • Stretching The Limits Of Lithography: MIT Creates 25 Nm Structures
    July 9, 2008 – 8:10 AM
    Cambridge (MA) - Researchers from the Massachusetts Institute of Technology (MIT) have found a way to develop 25 nm chip structures with a common lithography process, indicating that chip manufacturers will be able to push out the adoption of an expensive Extreme Ultraviolet (EUV) lithography manufacturing process by another chip generation.
  • ASML pushes EUV for sub 22 nm lithography
    September 13, 2006 – 11:00 AM
    ASML has reiterated its positive outlook for extreme ultraviolet (EUV) as the mainstream lithography light source when going to deep submicron production while its closely-tied pure-play foundry partner Taiwan Semiconductor Manufacturing Company (TSMC) said it is happy to see multiple choices for light sources at the deep submicron level, according to company executives during the ongoing SEMICON Taiwan 2006 show.

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