Results for photomask
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Intel and Corning to develop EUV photomask substrates for 32 nm production
July 6, 2005 – 4:20 PM
Intel has entered a joint development agreement with Corning to develop ultra low thermal expansion (ULE) glass photomask substrates required for Extreme Ultraviolet (EUV) lithography and semiconductors with transistor structures smaller than 40 nm. -
World's largest LCD photomask company starts operation in Taiwan
March 15, 2005 – 10:45 AM
Hoya Microelectronics Taiwan, the Taiwan-based subsidiary of Hoya, the world's largest LCD photomask supplier, held the opening ceremony for its plant in Hsinchu Science Park's (HSP) Chunan base last Friday.
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