Strained silicon to accelerate transistors by 24 percent

Sunnyvale (CA) - AMD and IBM have developed a strained silicon transistor technology which the firms believe will dramatically increase processor performance. Prototype transistors posted a 24 percent performance gain while running at the same power levels transistors produced without the technology.

The jointly developed strained silicon for the first time is compatible with silicon-on-insulator (SOI) technology. According to the firms, the process can be used to tackle electrical leakage and inefficient switching which result from transistor scaling and increased transistor frequency.

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Wolfgang Gruener is an experienced professional in digital strategy and content, specializing in web strategy, content architecture, user experience, and applying AI in content operations within the insurtech industry. His previous roles include Director, Digital Strategy and Content Experience at American Eagle, Managing Editor at TG Daily, and contributing to publications like Tom's Guide and Tom's Hardware.