Rapidus to reportedly install 10 EUV chipmaking tools at its fab in Japan

ASML EUV machine
(Image credit: ASML)

Rapidus plans to install as many as 10 EUV lithography tools into its upcoming fabs in Japan, reports TrendForce, citing Nikkan Kogyo Shimbun. The tools will be used for mass production of chips on 2nm-class process technology starting in 2027. 

Rapidus plans to install 10 EUV lithography machines in its IIM-1 and IIM-2 semiconductor production facilities, according to Atsuyoshi Koike, the chief executive, who spoke with Nikkan. In December 2024, the first EUV lithography equipment for Japan arrived at New Chitose Airport, marking a key milestone in Rapidus's development and the revival of the Japanese semiconductor industry. 

Atsuyoshi Koike did not disclose the schedule at which the company will install its EUV tools, but it is logical to expect some leading-edge lithography systems to be installed at IIM-1 over the next couple of years, with the remaining set to be installed at IIM-2 later. 

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Anton Shilov
Contributing Writer

Anton Shilov is a contributing writer at Tom’s Hardware. Over the past couple of decades, he has covered everything from CPUs and GPUs to supercomputers and from modern process technologies and latest fab tools to high-tech industry trends.