Rapidus is first Japanese company to install ASML's cutting-edge EUV machine — chipmaking tool for 2nm chips expected to be operational in early 2025

ASML
(Image credit: ASML)

Rapidus has successfully begun installing ASML's Twinscan NXE:3800E EUV lithography system at its Innovative Integration for Manufacturing (IIM-1) facility in Chitose, Hokkaido, marking a significant milestone for Japan’s semiconductor industry. In 2025, the tool will be used to make prototype chips using a 2nm process technology and then for commercial semiconductor production starting in 2027.

ASML's Twinscan NXE:3800E lithography system is currently the company's most advanced lithography tool explicitly designed to produce chips at 2nm-class process technologies and beyond. The machine features ASML's latest high-power light source, a new wafer handler, faster wafer stages, and other components needed to support increased throughput, enabling the performance of over 220 wafers per hour at a 30 mJ/cm² dose.

Rapidus's Innovative Integration for Manufacturing (IIM-1) facility will cost around $32 billion when fully built and equipped, but the company must still secure funding. Japanese banks are reluctant to provide money to a company with no track record.

Edit 12/20/2024 4:20am PT: Corrected title to reference correct year. 

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Anton Shilov
Contributing Writer

Anton Shilov is a contributing writer at Tom’s Hardware. Over the past couple of decades, he has covered everything from CPUs and GPUs to supercomputers and from modern process technologies and latest fab tools to high-tech industry trends.

  • Co BIY
    Rapidus is still not a household name. A little explanation of who they are would help at the beginning of these articles.
    Reply