High NA EUV

Latest about High NA EUV

TSMC fab
Analyst firm raises alarm about EUV chipmaking tool power consumption

By Anton Shilov Published

Leading-edge semiconductor fabs to consume 54,000 Gigawatts a year by 2030, which is more than some countries consume today.

Tech Industry
Mask
Corning's Extreme ULE glass debuts for next-gen High-NA EUV chipmaking

By Anton Shilov Published

Corning introduces new Extreme ULE glass for photomasks and mirrors to be used with next-generation EUV and High-NA EUV tools.

Tech Industry
ASML
TSMC's first High-NA EUV litho tool to begin installation this month say industry insiders

By Anton Shilov Published

TSMC to start installing High-NA EUV system for R&D purposes this month.

Tech Industry
Imec
Samsung may start installing its first High-NA EUV litho tool in late 2024

By Anton Shilov Published

Samsung will be about a year behind Intel in installing ASML's Twinscan EXE:5000 High-NA litho tool for development purposes.

Tech Industry
ASML
TSMC says it doesn't need High-NA EUV chipmaking tools for 1.6nm-class node, but Intel has championed the tech

By Anton Shilov Published

TSMC says it will not need a high-NA litho tool for its A16 technology but will keep exploring it for A16 and beyond.

Tech Industry
Intel
Intel completes assembly of first commercial High-NA EUV chipmaking tool — addresses cost concerns, preps for 14A process development in 2025

By Paul Alcorn Published

Intel Foundry announced it had completed the assembly of the industry's first commercial High Numerical Aperture (High-NA) Extreme Ultraviolet (EUV) machine in its D1X fab in Oregon.

CPUs
ASML
ASML ships its second High-NA EUV litho tool to unspecified client

By Anton Shilov Published

ASML begins to ship its High-NA EUV lithography system to the second customer

Tech Industry
ASML
ASML sets density record with latest chipmaking tools — High-NA EUV equipment prints first patterns

By Anton Shilov Published

ASML has reached another milestone with its Twinscan EXE:5000 lithography system.

Tech Industry
ASML
Samsung rep says High-NA EUV is good for logic, but might have cost issues for memory fabrication

By Anton Shilov Published

Samsung shares its views on High-NA EIV costs, while other companies present more bullish views.

Manufacturing
Intel
Intel shares biggest unboxing video ever as ASML’s $380 million High-NA lithography machine is installed in Oregon fab

By Anton Shilov Published

Intel posts video showing the arrival and installation of its cutting-edge High-NA lithography machine.

Semiconductors
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