Latest about High NA EUV
Samsung rep says High-NA EUV is good for logic, but might have cost issues for memory fabrication
Samsung shares its views on High-NA EIV costs, while other companies present more bullish views.
Intel shares biggest unboxing video ever as ASML’s $380 million High-NA lithography machine is installed in Oregon fab
Intel posts video showing the arrival and installation of its cutting-edge High-NA lithography machine.
Intel and ASML achieve 'First Light' milestone with world's most advanced chipmaking tool
ASML and Intel achieve first light on wafer milestone with ASML's Twinscan EXE:5000 lithography system for the first time.
ASML explores Hyper-NA chipmaking tools as the next step in shrinking transistors
ASML mulls Hyper-NA lithography with a higher than 0.7 numerical aperture in 2030s.
Evidence mounts that TSMC won't adopt next-gen EUV chipmaking tools until 1nm debuts in the 2030 timeframe
Fab toolmaker tells DigiTimes that TSMC will likely adopt High-NA at 1nm.
ASML fires back at accusations that its next-gen High-NA EUV chipmaking tools are too expensive
ASML asserts that its next-generation High-NA EUV tools have numerous advantages over existing Low-NA tools.
TSMC won't adopt advanced High-NA EUV chipmaking tools until 2030 or later
According to China Renaissance, TSMC might adopt High-NA EUV lithography for a post-1nm process technology in 2030 or later.
ASML ships groundbreaking new chipmaking tool to Intel — High-NA lithography tool needed for next-gen process nodes could cost ~$400 million
ASML on Thursday announced that it had begun shipping the industry's first extreme ultraviolet (EUV) lithography tool with a 0.55 numerical aperture (High-NA) to Intel.
