High NA EUV
Latest about High NA EUV
TSMC rumored to receive High NA EUV machines from ASML this year
By Jowi Morales published
TSMC is set to receive its first shipment of ASML's High NA EUV machine later this year.
Analyst firm raises alarm about EUV chipmaking tool power consumption
By Anton Shilov published
Leading-edge semiconductor fabs to consume 54,000 Gigawatts a year by 2030, which is more than some countries consume today.
Corning's Extreme ULE glass debuts for next-gen High-NA EUV chipmaking
By Anton Shilov published
Corning introduces new Extreme ULE glass for photomasks and mirrors to be used with next-generation EUV and High-NA EUV tools.
TSMC's first High-NA EUV litho tool to begin installation this month say industry insiders
By Anton Shilov published
TSMC to start installing High-NA EUV system for R&D purposes this month.
TSMC says it doesn't need High-NA EUV chipmaking tools for 1.6nm-class node, but Intel has championed the tech
By Anton Shilov published
TSMC says it will not need a high-NA litho tool for its A16 technology but will keep exploring it for A16 and beyond.
Intel completes assembly of first commercial High-NA EUV chipmaking tool — addresses cost concerns, preps for 14A process development in 2025
By Paul Alcorn published
Intel Foundry announced it had completed the assembly of the industry's first commercial High Numerical Aperture (High-NA) Extreme Ultraviolet (EUV) machine in its D1X fab in Oregon.
ASML ships its second High-NA EUV litho tool to unspecified client
By Anton Shilov published
ASML begins to ship its High-NA EUV lithography system to the second customer
ASML sets density record with latest chipmaking tools — High-NA EUV equipment prints first patterns
By Anton Shilov published
ASML has reached another milestone with its Twinscan EXE:5000 lithography system.
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