Latest about High NA EUV
Samsung Foundry updates process roadmap to move 1.4nm to 2029
Samsung Foundry's plans change significantly from the 2024 roadmap.
ASML's planned Low-NA EUV machine price hikes reportedly anger TSMC
Premium Low-NA, high stakes
Intel becomes the first company to ship high-volume logic chips made with ASML's High NA EUV
Intel is using ASML’s High-NA EUV tools to pattern select Panther Lake layers, marking the technology’s first use in high-volume logic production
Intel expands production of photomasks in California: EUV and High-NA EUV in the focal point
Intel begins expansion of its Bowers Campus in Santa Clara to produce more photomasks in-house, which is set to be crucial as process technologies get more sophisticated.
ASML makes breakthrough in EUV chipmaking tech, plans to increase speed by 50% by 2030
ASML to use a new CO2 laser system and tin droplet generator to increase EUV light source performance to 1000W and lithography tool productivity to 330 wafers per hour in 2030 and beyond.
Intel installs industry's first commercial High-NA EUV lithography tool
Sets the stage for 14A process technology.
'Beyond EUV' chipmaking tech pushes Soft X-Ray lithography closer to challenging Hyper-NA EUV
But will it ever materialize?
ASML and SK hynix assemble industry-first 'commercial' High-NA EUV system at fab in South Korea
Initially for R&D use, until later this decade where it will transition to production
