Latest about High NA EUV
TSMC says it doesn't need High-NA EUV chipmaking tools for 1.6nm-class node, but Intel has championed the tech
TSMC says it will not need a high-NA litho tool for its A16 technology but will keep exploring it for A16 and beyond.
Intel completes assembly of first commercial High-NA EUV chipmaking tool — addresses cost concerns, preps for 14A process development in 2025
Intel Foundry announced it had completed the assembly of the industry's first commercial High Numerical Aperture (High-NA) Extreme Ultraviolet (EUV) machine in its D1X fab in Oregon.
ASML ships its second High-NA EUV litho tool to unspecified client
ASML begins to ship its High-NA EUV lithography system to the second customer
ASML sets density record with latest chipmaking tools — High-NA EUV equipment prints first patterns
ASML has reached another milestone with its Twinscan EXE:5000 lithography system.
Samsung rep says High-NA EUV is good for logic, but might have cost issues for memory fabrication
Samsung shares its views on High-NA EIV costs, while other companies present more bullish views.
Intel shares biggest unboxing video ever as ASML’s $380 million High-NA lithography machine is installed in Oregon fab
Intel posts video showing the arrival and installation of its cutting-edge High-NA lithography machine.
Intel and ASML achieve 'First Light' milestone with world's most advanced chipmaking tool
ASML and Intel achieve first light on wafer milestone with ASML's Twinscan EXE:5000 lithography system for the first time.
ASML explores Hyper-NA chipmaking tools as the next step in shrinking transistors
ASML mulls Hyper-NA lithography with a higher than 0.7 numerical aperture in 2030s.
