Latest about High NA EUV
TSMC won't adopt advanced High-NA EUV chipmaking tools until 2030 or later
According to China Renaissance, TSMC might adopt High-NA EUV lithography for a post-1nm process technology in 2030 or later.
ASML ships groundbreaking new chipmaking tool to Intel — High-NA lithography tool needed for next-gen process nodes could cost ~$400 million
ASML on Thursday announced that it had begun shipping the industry's first extreme ultraviolet (EUV) lithography tool with a 0.55 numerical aperture (High-NA) to Intel.
Intel is buying leading-edge lithography tools — report says Intel will acquire 6 of 10 High-NA EUV tools produced by ASML next year
Intel is gearing up to be high-NA EUV lithography champ with orders for six additional Twinscan EXE machines.
ASML to Ship First High-NA EUV Tool This Year: $300 Million per Scanner
ASML expects its partners to start using High-NA EUV scanners in 2025 and beyond.
