Latest about High NA EUV
Intel has championed High-NA EUV chipmaking tools, but costs and other limitations could delay industry-wide adoption: Report
Delay, but not stop.
ASML teams up with Imec for sub-2nm process technologies with High-NA EUV chipmaking tools
ASML to install its High-NA EUV lithography tools in Imec's pilot production line to give research and development personnel access to leading-edge equipment.
Intel has processed 30,000 wafers with High-NA EUV chipmaking tool
Intel says ASML's High-NA EUV tools have produced 30,000 wafers in a single quarter.
American lab is developing a BAT laser that could enable 'beyond EUV' lithography
Petawatt-class thulium lasers could replace CO2 lasers in lithography machines down the road.
ASML made a $230 Lego kit version of its $380 million semiconductor tool
ASML has added the TWINSCAN EXE:5000 Lego set to its growing portfolio of gifts.
TSMC rumored to receive High NA EUV machines from ASML this year
TSMC is set to receive its first shipment of ASML's High NA EUV machine later this year.
Analyst firm raises alarm about EUV chipmaking tool power consumption
Leading-edge semiconductor fabs to consume 54,000 Gigawatts a year by 2030, which is more than some countries consume today.
Corning's Extreme ULE glass debuts for next-gen High-NA EUV chipmaking
Corning introduces new Extreme ULE glass for photomasks and mirrors to be used with next-generation EUV and High-NA EUV tools.