High NA EUV
Latest about High NA EUV

Intel will cancel 14A and following nodes if it can't win a major external customer
By Anton Shilov published
Then exit the leading-edge process technologies completely.

Company proposes 'tabletop' particle accelerators with petawatt lasers
By Anton Shilov published
Y-Combinator-backed startup eyes powerful laser wakefield accelerator for advanced lithography techniques.

TSMC reiterates it doesn't need High-NA EUV for 1.4nm-class process technology
By Anton Shilov published
But we will use it eventually.

Intel has championed High-NA EUV chipmaking tools, but costs and other limitations could delay industry-wide adoption: Report
By Anton Shilov published
Delay, but not stop.

ASML teams up with Imec for sub-2nm process technologies with High-NA EUV chipmaking tools
By Anton Shilov published
ASML to install its High-NA EUV lithography tools in Imec's pilot production line to give research and development personnel access to leading-edge equipment.

Intel has processed 30,000 wafers with High-NA EUV chipmaking tool
By Anton Shilov published
Intel says ASML's High-NA EUV tools have produced 30,000 wafers in a single quarter.

American lab is developing a BAT laser that could enable 'beyond EUV' lithography
By Anton Shilov published
Petawatt-class thulium lasers could replace CO2 lasers in lithography machines down the road.

ASML made a $230 Lego kit version of its $380 million semiconductor tool
By Mark Tyson published
ASML has added the TWINSCAN EXE:5000 Lego set to its growing portfolio of gifts.
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