Latest about High NA EUV
ASML makes breakthrough in EUV chipmaking tech, plans to increase speed by 50% by 2030
ASML to use a new CO2 laser system and tin droplet generator to increase EUV light source performance to 1000W and lithography tool productivity to 330 wafers per hour in 2030 and beyond.
Intel installs industry's first commercial High-NA EUV lithography tool
Sets the stage for 14A process technology.
'Beyond EUV' chipmaking tech pushes Soft X-Ray lithography closer to challenging Hyper-NA EUV
But will it ever materialize?
ASML and SK hynix assemble industry-first 'commercial' High-NA EUV system at fab in South Korea
Initially for R&D use, until later this decade where it will transition to production
Intel will cancel 14A and following nodes if it can't win a major external customer
Then exit the leading-edge process technologies completely.
Company proposes 'tabletop' particle accelerators with petawatt lasers
News Analysis Y-Combinator-backed startup eyes powerful laser wakefield accelerator for advanced lithography techniques.
TSMC reiterates it doesn't need High-NA EUV for 1.4nm-class process technology
But we will use it eventually.
Intel has championed High-NA EUV chipmaking tools, but costs and other limitations could delay industry-wide adoption: Report
Delay, but not stop.
