Latest about High NA EUV
ASML and SK hynix assemble industry-first 'commercial' High-NA EUV system at fab in South Korea
Initially for R&D use, until later this decade where it will transition to production
Intel will cancel 14A and following nodes if it can't win a major external customer
Then exit the leading-edge process technologies completely.
Company proposes 'tabletop' particle accelerators with petawatt lasers
News Analysis Y-Combinator-backed startup eyes powerful laser wakefield accelerator for advanced lithography techniques.
TSMC reiterates it doesn't need High-NA EUV for 1.4nm-class process technology
But we will use it eventually.
Intel has championed High-NA EUV chipmaking tools, but costs and other limitations could delay industry-wide adoption: Report
Delay, but not stop.
ASML teams up with Imec for sub-2nm process technologies with High-NA EUV chipmaking tools
ASML to install its High-NA EUV lithography tools in Imec's pilot production line to give research and development personnel access to leading-edge equipment.
Intel has processed 30,000 wafers with High-NA EUV chipmaking tool
Intel says ASML's High-NA EUV tools have produced 30,000 wafers in a single quarter.
American lab is developing a BAT laser that could enable 'beyond EUV' lithography
Petawatt-class thulium lasers could replace CO2 lasers in lithography machines down the road.
