Latest about EUV
New 1.4nm nanoimprint lithography template could reduce the need for EUV steps in advanced process nodes
Premium Japan’s Dai Nippon Printing (DNP) claims to have developed a nanoimprint lithography template capable of patterning logic with a feature size of 1.4nm, with plans for mass production in 2027.
Chinese scientists discover method to cut defects by 99% with DUV chipmaking equipment
Premium But chipmakers already know this empirically.
European think tank considers punitive DUV machine export ban following China's latest round of rare earth export controls
Premium Think tank suggests tighter semiconductor controls amid rare earth tensions.
TSMC reduces peak power consumption of EUV tools by 44% — company to save 190 million kilowatt-hours of electricity by 2030
Reducing power consumption by 8%
China bets on DUV as EUV blockade reshapes chipmaking — but it won't dethrone ASML's advanced lithography, for now
Premium With EUV locked out by sanctions, China is leaning on DUV multi-patterning and fledgling domestic scanners.
'Beyond EUV' chipmaking tech pushes Soft X-Ray lithography closer to challenging Hyper-NA EUV
But will it ever materialize?
How TSMC managed to increase efficiency of ASML's EUV tools: System-level optimizations and in-house pellicles
Premium TSMC has dramatically boosted EUV scanner throughput, pellicle performance, and energy efficiency through deep in-house innovations.
ASML and SK hynix assemble industry-first 'commercial' High-NA EUV system at fab in South Korea
Initially for R&D use, until later this decade where it will transition to production
